Our UHV Probe Stations feature multiple precision 3-axis linear manipulators, enabling accurate and independent positioning of probes within an ultra-high vacuum chamber achieving base pressures down to 10⁻¹¹ Torr. Designed for demanding applications in semiconductor research, surface science, and materials characterization, these systems support up to 8 manipulators with micron-level resolution (typically less than ±2 μm), compatible with coaxial or triaxial probe tips for DC, RF, and low-noise electrical measurements. Robust all-metal sealed construction ensures contamination-free environments, with optional cryogenic cooling integration for temperatures as low as 18 K and sample heating as required. Ideal for non-destructive wafer probing and advanced device testing under extreme vacuum conditions.