UHV Evaporators for PVD

Our UHV Evaporators for PVD deliver exceptional performance in ultra-high vacuum environments, featuring a powerful single electron beam source capable of achieving material temperatures of 1200°C and beyond. This advanced design enables precise evaporation of virtually any metal or high-melting-point compound, producing ultra-pure thin films with outstanding uniformity and adhesion. Ideal for research and production applications requiring minimal contamination and high deposition rates, these compact, reliable systems ensure superior control and reproducibility for demanding PVD processes.